JPH0119404Y2 - - Google Patents

Info

Publication number
JPH0119404Y2
JPH0119404Y2 JP1985101810U JP10181085U JPH0119404Y2 JP H0119404 Y2 JPH0119404 Y2 JP H0119404Y2 JP 1985101810 U JP1985101810 U JP 1985101810U JP 10181085 U JP10181085 U JP 10181085U JP H0119404 Y2 JPH0119404 Y2 JP H0119404Y2
Authority
JP
Japan
Prior art keywords
region
type
semiconductor
buried
layer
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP1985101810U
Other languages
English (en)
Japanese (ja)
Other versions
JPS6142862U (ja
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Publication of JPS6142862U publication Critical patent/JPS6142862U/ja
Application granted granted Critical
Publication of JPH0119404Y2 publication Critical patent/JPH0119404Y2/ja
Granted legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D62/00—Semiconductor bodies, or regions thereof, of devices having potential barriers
    • H10D62/10—Shapes, relative sizes or dispositions of the regions of the semiconductor bodies; Shapes of the semiconductor bodies
    • H10D62/113—Isolations within a component, i.e. internal isolations
    • H10D62/115—Dielectric isolations, e.g. air gaps
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/70—Manufacture or treatment of devices consisting of a plurality of solid state components formed in or on a common substrate or of parts thereof; Manufacture of integrated circuit devices or of parts thereof
    • H01L21/71—Manufacture of specific parts of devices defined in group H01L21/70
    • H01L21/74—Making of localized buried regions, e.g. buried collector layers, internal connections substrate contacts
    • H01L21/743—Making of internal connections, substrate contacts
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D84/00—Integrated devices formed in or on semiconductor substrates that comprise only semiconducting layers, e.g. on Si wafers or on GaAs-on-Si wafers
    • H10D84/01—Manufacture or treatment
    • H10D84/0112—Integrating together multiple components covered by H10D8/00, H10D10/00 or H10D18/00, e.g. integrating multiple BJTs
    • H10D84/0119—Integrating together multiple components covered by H10D8/00, H10D10/00 or H10D18/00, e.g. integrating multiple BJTs the components including complementary BJTs
    • H10D84/0121—Integrating together multiple components covered by H10D8/00, H10D10/00 or H10D18/00, e.g. integrating multiple BJTs the components including complementary BJTs the complementary BJTs being vertical BJTs
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D84/00—Integrated devices formed in or on semiconductor substrates that comprise only semiconducting layers, e.g. on Si wafers or on GaAs-on-Si wafers
    • H10D84/01—Manufacture or treatment
    • H10D84/02—Manufacture or treatment characterised by using material-based technologies
    • H10D84/03—Manufacture or treatment characterised by using material-based technologies using Group IV technology, e.g. silicon technology or silicon-carbide [SiC] technology
    • H10D84/038—Manufacture or treatment characterised by using material-based technologies using Group IV technology, e.g. silicon technology or silicon-carbide [SiC] technology using silicon technology, e.g. SiGe
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D84/00—Integrated devices formed in or on semiconductor substrates that comprise only semiconducting layers, e.g. on Si wafers or on GaAs-on-Si wafers
    • H10D84/60—Integrated devices formed in or on semiconductor substrates that comprise only semiconducting layers, e.g. on Si wafers or on GaAs-on-Si wafers characterised by the integration of at least one component covered by groups H10D10/00 or H10D18/00, e.g. integration of BJTs
    • H10D84/611—Combinations of BJTs and one or more of diodes, resistors or capacitors
    • H10D84/613—Combinations of vertical BJTs and one or more of diodes, resistors or capacitors
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D84/00—Integrated devices formed in or on semiconductor substrates that comprise only semiconducting layers, e.g. on Si wafers or on GaAs-on-Si wafers
    • H10D84/60—Integrated devices formed in or on semiconductor substrates that comprise only semiconducting layers, e.g. on Si wafers or on GaAs-on-Si wafers characterised by the integration of at least one component covered by groups H10D10/00 or H10D18/00, e.g. integration of BJTs
    • H10D84/641—Combinations of only vertical BJTs
    • H10D84/643—Combinations of non-inverted vertical BJTs and inverted vertical BJTs
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D84/00—Integrated devices formed in or on semiconductor substrates that comprise only semiconducting layers, e.g. on Si wafers or on GaAs-on-Si wafers
    • H10D84/60—Integrated devices formed in or on semiconductor substrates that comprise only semiconducting layers, e.g. on Si wafers or on GaAs-on-Si wafers characterised by the integration of at least one component covered by groups H10D10/00 or H10D18/00, e.g. integration of BJTs
    • H10D84/67—Complementary BJTs
    • H10D84/673—Vertical complementary BJTs
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S148/00—Metal treatment
    • Y10S148/131—Reactive ion etching rie

Landscapes

  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Bipolar Integrated Circuits (AREA)
  • Bipolar Transistors (AREA)
  • Element Separation (AREA)
  • Electrodes Of Semiconductors (AREA)
JP1985101810U 1977-10-25 1985-07-05 縦形ｐｎｐトランジスタを含む集積回路 Granted JPS6142862U (ja)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US05/844,767 US4159915A (en) 1977-10-25 1977-10-25 Method for fabrication vertical NPN and PNP structures utilizing ion-implantation
US844767 1977-10-25

Publications (2)

Publication Number Publication Date
JPS6142862U JPS6142862U (ja) 1986-03-19
JPH0119404Y2 true JPH0119404Y2 (en]) 1989-06-05

Family

ID=25293575

Family Applications (3)

Application Number Title Priority Date Filing Date
JP12368578A Pending JPS5467384A (en) 1977-10-25 1978-10-09 Longitudinal pnp semiconductor
JP56201714A Granted JPS57122563A (en) 1977-10-25 1981-12-16 Method of producing vertical npn and pnp transistor
JP1985101810U Granted JPS6142862U (ja) 1977-10-25 1985-07-05 縦形ｐｎｐトランジスタを含む集積回路

Family Applications Before (2)

Application Number Title Priority Date Filing Date
JP12368578A Pending JPS5467384A (en) 1977-10-25 1978-10-09 Longitudinal pnp semiconductor
JP56201714A Granted JPS57122563A (en) 1977-10-25 1981-12-16 Method of producing vertical npn and pnp transistor

Country Status (4)

Country Link
US (1) US4159915A (en])
EP (1) EP0001586B1 (en])
JP (3) JPS5467384A (en])
DE (1) DE2861117D1 (en])

Families Citing this family (26)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4316319A (en) * 1977-10-25 1982-02-23 International Business Machines Corporation Method for making a high sheet resistance structure for high density integrated circuits
JPS5499580A (en) * 1977-12-27 1979-08-06 Nec Corp Semiconductor integrated circuit device
US4214946A (en) * 1979-02-21 1980-07-29 International Business Machines Corporation Selective reactive ion etching of polysilicon against SiO2 utilizing SF6 -Cl2 -inert gas etchant
US4412376A (en) * 1979-03-30 1983-11-01 Ibm Corporation Fabrication method for vertical PNP structure with Schottky barrier diode emitter utilizing ion implantation
US4425574A (en) 1979-06-29 1984-01-10 International Business Machines Corporation Buried injector memory cell formed from vertical complementary bipolar transistor circuits and method of fabrication therefor
US4254428A (en) * 1979-12-28 1981-03-03 International Business Machines Corporation Self-aligned Schottky diode structure and method of fabrication
US4309812A (en) * 1980-03-03 1982-01-12 International Business Machines Corporation Process for fabricating improved bipolar transistor utilizing selective etching
US4318751A (en) * 1980-03-13 1982-03-09 International Business Machines Corporation Self-aligned process for providing an improved high performance bipolar transistor
US4339767A (en) * 1980-05-05 1982-07-13 International Business Machines Corporation High performance PNP and NPN transistor structure
US4506435A (en) * 1981-07-27 1985-03-26 International Business Machines Corporation Method for forming recessed isolated regions
US4492008A (en) * 1983-08-04 1985-01-08 International Business Machines Corporation Methods for making high performance lateral bipolar transistors
US5098854A (en) * 1984-07-09 1992-03-24 National Semiconductor Corporation Process for forming self-aligned silicide base contact for bipolar transistor
US4947230A (en) * 1984-09-14 1990-08-07 Fairchild Camera & Instrument Corp. Base-coupled transistor logic
DE3883459T2 (de) * 1987-07-29 1994-03-17 Fairchild Semiconductor Verfahren zum Herstellen komplementärer kontaktloser vertikaler Bipolartransistoren.
US5332920A (en) * 1988-02-08 1994-07-26 Kabushiki Kaisha Toshiba Dielectrically isolated high and low voltage substrate regions
IT1230025B (it) * 1988-10-28 1991-09-24 Sgs Thomson Microelectronics Dispositivo darlington con transistore di estrazione ed emettitore ultraleggero e relativo procedimento di fabbricazione
US4951115A (en) * 1989-03-06 1990-08-21 International Business Machines Corp. Complementary transistor structure and method for manufacture
US5026437A (en) * 1990-01-22 1991-06-25 Tencor Instruments Cantilevered microtip manufacturing by ion implantation and etching
US4997775A (en) * 1990-02-26 1991-03-05 Cook Robert K Method for forming a complementary bipolar transistor structure including a self-aligned vertical PNP transistor
US5248624A (en) * 1991-08-23 1993-09-28 Exar Corporation Method of making isolated vertical pnp transistor in a complementary bicmos process with eeprom memory
DE19632412A1 (de) * 1996-08-05 1998-02-12 Sifu Hu Vertikaler Bipolartransistor und Verfahren zu seiner Herstellung
US6344374B1 (en) * 2000-10-12 2002-02-05 Vanguard International Semiconductor Corporation Method of fabricating insulators for isolating electronic devices
US7332818B2 (en) * 2005-05-12 2008-02-19 Endicott Interconnect Technologies, Inc. Multi-chip electronic package with reduced line skew and circuitized substrate for use therein
US7329940B2 (en) * 2005-11-02 2008-02-12 International Business Machines Corporation Semiconductor structure and method of manufacture
US7242071B1 (en) * 2006-07-06 2007-07-10 International Business Machine Corporation Semiconductor structure
US7936041B2 (en) 2006-09-15 2011-05-03 International Business Machines Corporation Schottky barrier diodes for millimeter wave SiGe BICMOS applications

Family Cites Families (22)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3930909A (en) * 1966-10-21 1976-01-06 U.S. Philips Corporation Method of manufacturing a semiconductor device utilizing simultaneous outdiffusion during epitaxial growth
US3659675A (en) * 1969-06-30 1972-05-02 Transportation Specialists Inc Lubrication system and reservoir therefor
US3611067A (en) * 1970-04-20 1971-10-05 Fairchild Camera Instr Co Complementary npn/pnp structure for monolithic integrated circuits
DE2212168C2 (de) * 1972-03-14 1982-10-21 Ibm Deutschland Gmbh, 7000 Stuttgart Monolithisch integrierte Halbleiteranordnung
JPS4911659U (en]) * 1972-05-09 1974-01-31
US3861968A (en) * 1972-06-19 1975-01-21 Ibm Method of fabricating integrated circuit device structure with complementary elements utilizing selective thermal oxidation and selective epitaxial deposition
DE2262297C2 (de) * 1972-12-20 1985-11-28 Ibm Deutschland Gmbh, 7000 Stuttgart Monolithisch integrierbare, logisch verknüpfbare Halbleiterschaltungsanordnung mit I↑2↑L-Aufbau
US3924264A (en) * 1973-05-17 1975-12-02 Ibm Schottky barrier device and circuit application
US3901735A (en) * 1973-09-10 1975-08-26 Nat Semiconductor Corp Integrated circuit device and method utilizing ion implanted and up diffusion for isolated region
US3968272A (en) * 1974-01-25 1976-07-06 Microwave Associates, Inc. Zero-bias Schottky barrier detector diodes
NL7408110A (nl) * 1974-06-18 1975-12-22 Philips Nv Halfgeleiderinrichting met complementaire tran- sistorstrukturen en werkwijze ter vervaardiging daarvan.
GB1516304A (en) * 1974-07-25 1978-07-05 Dunlop Ltd Outflow meter
US4199775A (en) * 1974-09-03 1980-04-22 Bell Telephone Laboratories, Incorporated Integrated circuit and method for fabrication thereof
US3999080A (en) * 1974-12-23 1976-12-21 Texas Instruments Inc. Transistor coupled logic circuit
DE2509530C2 (de) * 1975-03-05 1985-05-23 Ibm Deutschland Gmbh, 7000 Stuttgart Halbleiteranordnung für die Grundbausteine eines hochintegrierbaren logischen Halbleiterschaltungskonzepts basierend auf Mehrfachkollektor-Umkehrtransistoren
CA1056513A (en) * 1975-06-19 1979-06-12 Benjamin J. Sloan (Jr.) Integrated logic circuit and method of fabrication
US4005469A (en) * 1975-06-20 1977-01-25 International Business Machines Corporation P-type-epitaxial-base transistor with base-collector Schottky diode clamp
US4032962A (en) * 1975-12-29 1977-06-28 Ibm Corporation High density semiconductor integrated circuit layout
US4106049A (en) * 1976-02-23 1978-08-08 Tokyo Shibaura Electric Co., Ltd. Semiconductor device
DE2624409C2 (de) * 1976-05-31 1987-02-12 Siemens AG, 1000 Berlin und 8000 München Schottky-Transistor-Logik-Anordnung
US4021270A (en) * 1976-06-28 1977-05-03 Motorola, Inc. Double master mask process for integrated circuit manufacture
US4087900A (en) * 1976-10-18 1978-05-09 Bell Telephone Laboratories, Incorporated Fabrication of semiconductor integrated circuit structure including injection logic configuration compatible with complementary bipolar transistors utilizing simultaneous formation of device regions

Also Published As

Publication number Publication date
EP0001586B1 (de) 1981-09-23
JPS6142862U (ja) 1986-03-19
JPS5467384A (en) 1979-05-30
JPS57122563A (en) 1982-07-30
DE2861117D1 (en) 1981-12-10
EP0001586A1 (de) 1979-05-02
US4159915A (en) 1979-07-03
JPH0123953B2 (en]) 1989-05-09

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